Date: Jul 16, 2013 Source: (
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ALEXANDRIA, Va., July 16 -- United States Patent no. 8,487,556, issued on July 16, was assigned to Duly Research Inc. (Rancho Palos Verdes, Calif.).
"Ultra-high vacuum photoelectron linear accelerator" was invented by David U. L. Yu (Rancho Palos Verdes, Calif.) and Yan Luo (Manhattan Beach, Calif.).
According to the abstract* released by the U.
S. Patent & Trademark Office: "An rf linear accelerator for producing an electron beam. The outer wall of the rf cavity of said linear accelerator being perforated to allow gas inside said rf cavity to flow to a pressure chamber surrounding said rf cavity and having means of ultra high vacuum pumping of the cathode of said rf …
