News Article

Agnitron Technology Begins Fabrication of MOCVD GaNzilla Monolithic Injection Flange Prototype
Date: Aug 31, 2012
Source: Company Data ( click here to go to the source)

Featured firm in this article: Agnitron Technology Inc of Eden Prairie, MN



Agnitron Technology, Inc. announces the completion of design activities and the start of prototype fabrication for its proprietary MOCVD Monolithic Dual Flow Gas Injection Flange. The new MOCVD injection flange was designed as an upgrade for E300 GaNzillas I&II and will provide unmatched thickness and photoluminescence uniformity across wafer and wafer to wafer. Radical disturbances in the boundary layer are now easily prevented by process tuning of alkyl and hydride gases flow velocity and density.

"The Monolithic Dual Flow Gas Injection Flange concept has been a desire for process engineers over the years. Agnitron Technology's development of the revolutionary flange was in response to this unmet industry need," said Dennis Stucky, who managed field services for EMCORE and VEECO and is collaborating with Agnitron on several projects. "We are excited to offer this novel flange design as a solution which will simplify MOCVD processing on existing E300 GaN tools, while simultaneously saving time and reducing waste. Process characterization after maintenance events will be simplified, saving critical downtime in tuning the process back into specs"

The intricate design flow flange utilizes advanced machining and weldment fabrication techniques to provide the most innovative MOCVD injection flange ever built. The enhanced control over alkyl and hydride gas injection enabled by the Agnitron flange as a process improvement with significant benefits for stabilizing and enhancing system performance. The flange is scalable for a range of small to medium size reactors. It is also fully compatible with inductively heated wafer carriers. For more information contact Ross Miller, Technology Development Manager, at ross.miller@agnitron.com or visit http://agnitron.com/monolithic-dual-flow-gas-injection-flange/.

Agnitron Technology, Inc. specializes in developing emerging compound semiconductor material and device technologies into profitable commercial products as well as economical custom MOCVD equipment solutions. Agnitron's original IMPERIUM-MOCVD™ control software package is the premier MOCVD control system available in the world. Their diverse team and partners draw from backgrounds in physics, materials science, semiconductor processing and electrical and mechanical engineering. Collectively, this team is credited with more than 400 published manuscripts and over 50 patents. Visit www.agnitron.com for more information.