SBIR-STTR Award

In this phase 1 STTR, a roll-to-roll (R2R), high throughput nanoimprint lithography system and process prototype will be developed based on Molecular Imprints Inc.’s Jet and Flash Imprint Lithography (J-FIL) technology. The R2R system will incorporate resist ink jetting with web tension control to achieve sub-50nm lithography and the following key process attributes: (i) Thin and uniform residual layer control with a target sub-15nm (mean) and sub-2nm (sigma); (ii) High aspect ratio patterns (>3:1 ratio) at 50nm resolution with arbitrary complexity; (iii) High throughput with target of >5m/min; and (iv) low resist material usage (~50-150 micro-liters/m2). The resulting process will allow pattern transfer into dielectrics and metal films with control in pattern size and complexity; and the cost structure will be attractive even for commodity applications such as thin-film solar cells. This process could be applied to applications such as large area sub-wavelength photonics devices, displays, and solar cells. We will focus on plasmonic nanostructures for thin-film solar cells based on amorphous silicon. We will perform simulation studies to obtain optimal plasmonic structures for maximizing absorption at long wavelengths over a broad band. We will then demonstrate fabrication (including pattern transfer) of these representative plasmonic patterns in appropriate film stacks.

Keywords:
Thin And Uniform Residual Layer Nanoimprint Process, High Throughput Roll-To-Roll Jet And Flash Imprint Lithography (R2r J-Fil), Inline Ink Jet Based Resist Dispense With Near

Roll to Roll (R2R) printing, or web printing involves the patterning of flexible materials such as plastics or metal foils. R2R processing is in use today by industry and many R2R processes already exist for etch and deposition. However R2R patterning of arbitrary patterns with thin residual layer control at the nanoscale is far more challenging, particularly at a cost structure suited for commodity applications. If successful, the potential applications include flexible displays, and many types of nanophotonic devices including wire grid polarizers, and solar devices. The challenge, as always, is to create a process that is scalable and meets defectivity, throughput and cost of ownership requirements.

Keywords:
Jet And Flash Imprint Lithography, J-Fil, Imprint Lithography, Roll-To-Roll Imprint Lithography, R2r, Nanophotonic Devices, Wire Grid Polarizers, Metasurface Structures