Flexible Micro- and Nano-Patterning Tools for Photonics
Award last edited on: 4/3/2019

Sponsored Program
Awarding Agency
Total Award Amount
Award Phase
Solicitation Topic Code
Principal Investigator
Henry I Smith

Company Information

LumArray Inc (AKA: Lumarray LLC)

15 Ward Street
Somerville, MA 02143
   (617) 253-6865

Research Institution


Phase I

Contract Number: ----------
Start Date: ----    Completed: ----
Phase I year
Phase I Amount
LumArray, Inc. is developing, and in 4 months will deliver to NIST, a maskless photolithography system of low cost that will meet the specifications for resolution, placement accuracy, overlay, throughput and multilevel alignment required in photonic devices. In Phase I, complex and dense patterns of arbitrary geometry, of relevance to photonics and optoelectronics, will be written, including ring resonators, waveguides and grating-based waveguide couplers. LumArray proposes to enable its ZP-150TM maskless photolithography system to pattern 3-dimensional structures in SU8 and other photoresists by developing, in collaboration with the University of Utah, a 3D proximity-effect correction algorithm. In Phase II this capability will be demonstrated. For patterning non-flat flexible substrates, LumArray will investigate, in Phase I, schemes for increasing the depth of focus, and in Phase II will demonstrate such writing. Although LumArray currently guarantees dense patterns only down to 200 nm using the ZP-150TM, the company is pursuing 3 independent paths to sub-100 nm resolution, two of which are the subject of proposals to other agencies. In Summary, LumArray asserts that all of the requirements of Topic # ODD10-T006 can be met by the ZP-150TM and the enhancements that we propose.

Phase II

Contract Number: ----------
Start Date: ----    Completed: ----
Phase II year
Phase II Amount
This Phase II STTR proposal seeks to enhance the throughput and resolution of LumArray’s maskless photolithography system, the ZP-150, so that it meets the needs of photonic systems for high-fidelity, long-range spatial-phase coherence, full-wafer coverage, 3D structuring, patterning on non-flat surfaces, and sub-100 nm resolution. The ZP-150 is designed for compatibility with research as well as customized manufacturing of electronics, photonics and other products that employ micro- and nanoscale features. To exercise and demonstrate the enhanced performance achieved in the ZP-150, complex photonic-device structures will be written as well as computer-generated holograms and a diffractive-optical solar converter with over 30% photovoltaic efficiency. To achieve the desired enhancements, 7 specific tasks are proposed.

Maskless Lithography, Maskless Photolithography, Computer-Generated Holograms, Sub-100 Nm Resolution