SBIR-STTR Award

Epitaxial Metal Oxide Thin Films Using a Novel Polymer Assisted Deposition (PAD) Technique
Award last edited on: 3/19/2024

Sponsored Program
SBIR
Awarding Agency
NSF
Total Award Amount
$599,353
Award Phase
2
Solicitation Topic Code
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Principal Investigator
Bo-Kuai Lai

Company Information

Lake Shore Cryotronics Inc (AKA: Desert Cryogenics)

575 McCorkle Boulevard
Westerville, OH 43082
   (614) 891-2243
   info@lakeshore.com
   www.lakeshore.com
Location: Multiple
Congr. District: 12
County: Delaware

Phase I

Contract Number: 0740854
Start Date: 1/1/2008    Completed: 10/31/2008
Phase I year
2007
Phase I Amount
$99,832
This Small Business Innovation Research (SBIR) Phase I project will demonstrate method of depositing high density and reproducible epitaxial metal oxide thin films using a spin-on deposition technique. This method is not limited to the oxides, but can be used to deposit thin films of nitrides, carbides, and sulfides as well. The project will focus mainly on process development in which only a few selected metal oxides will be used. The thickness of the film's can be controlled over a wide range from few nanometers to several micrometers. The process is organic solvent-free and avoids typical problems encountered with sol-gel processes, which makes it attractive for commercialization. Both conducting and dielectric films can be deposited. The broader impact/commercial potential from this technology will be improved and lower cost manufacturing processes for thin films of simple or complex oxides, where Chemical Vapor Deposition (CVD) or sol-gel methods are currently used. The ability to deposit high-density epitaxial films without the need of expensive vacuum or CVD equipment could revolutionize the field of epitaxial coatings and lead to efficient devices, such as electronic devices, sensors and micro-actuators

Phase II

Contract Number: 0924659
Start Date: 9/1/2009    Completed: 3/31/2012
Phase II year
2009
Phase II Amount
$499,521
This award is funded under the American Recovery and Reinvestment Act of 2009 (Public Law 111-5). This Small Business Innovation Research (SBIR) Phase II proposal seeks to develop extremely high energy density capacitors based on spin-on metal oxide dielectric and conductor technology and will combine this technology with very high surface area substrates fabrication technology. This capacitor technology will be all solid state, inexpensive to produce, and will rival ultracapacitors in energy density. The frequency range and loss characteristics will be superior to those of other capacitor technologies and will be polarity independent. The dielectrics will be adaptable through the range of properties of the perovskite family of metal oxides, as well as non-perovskites, and will be useful for multilayer, metamaterial tailoring of properties to fit the requirements of various applications, including high voltages. The broader impact/commercial potential from this technology will be availability of high reliability, high performance capacitors for critical applications at a reasonable price due to lower cost of manufacturing. It is a disruptive technology that has applications in other areas such as solar cells, ferroelectric memories, sensors, and micro-actuators. This technology will be part of the solution for alternative energy sources and will help improve the nation's chances for energy independence