SBIR-STTR Award

Nanostructured Materials and Process for Improved Electrochromic Device Performance
Award last edited on: 4/8/2008

Sponsored Program
SBIR
Awarding Agency
NSF
Total Award Amount
$590,991
Award Phase
2
Solicitation Topic Code
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Principal Investigator
Douglas Weir

Company Information

SAGE Electrochromics Inc

One Sage Way
Faribault, MN 55021
   (507) 331-4848
   info@sageglass.com
   www.sageglass.com
Location: Single
Congr. District: 01
County: Rice

Phase I

Contract Number: ----------
Start Date: ----    Completed: ----
Phase I year
2005
Phase I Amount
$100,000
This Small Business Innovation Research (SBIR) Phase I project addresses a novel processing technique for depositing binary nanocomposite metal oxide thin films to yield electrochromic (EC) devices with superior performance and reliability. EC technology is used to fabricate smart windows that can be electronically tinted to control solar light and heat. Materials with designed composition and nanostructure will enable maximum fracture toughness and minimal biaxial stress of key layers in EC devices. The more robust films are expected to boost the reliability of smart window products which are exposed to a wide range of environmental and solar conditions while being switched tens of thousands of times over their expected lifetime. The nanotechnology innovation will also result in faster switching of large (>1.5m) EC windows and enable higher light transmission in the clear state with better color neutrality in the tinted state. The technical objective is to explore sputter deposition and thermal annealing to yield stable nanocomposites in EC thin films. Designed experiments will explore resulting beneficial mechanical and optical film properties. Finally, the EC performance of lab scale devices incorporating nanostructured films will be evaluated. The global market for energy saving EC architectural windows is predicted to be $13.8 billion in annual sales at maturity. The performance and reliability improvements achievable as a result of this project are essential for widespread market acceptance. OEM window companies, architects, and building occupants require the larger windows and improved transmission properties obtainable with nanostructured materials. In addition, the increased film toughness will lead to higher yields during manufacturing with concomitant lower costs. In addition to architectural windows, deposition technologies for nanostructured films can improve the performance of flat panel displays and alternative gate oxides for advanced CMOS technology

Phase II

Contract Number: ----------
Start Date: ----    Completed: ----
Phase II year
2007
Phase II Amount
$490,991
This Small Business Innovation Research Phase II research project is to develop full size electrochromic (EC) window glazings with superior performance and durability due to the incorporation of sputtered nanocomposite thin film materials. These window glazings can be electronically darkened to control solar light and heat in buildings and vehicles. The new materials and processes will be tested for prototype glazings followed by the development of a robust manufacturing process with optimum product yield and reliability. Numerical simulation techniques will be used to model how process input variables impact product attributes with a goal of minimizing device variation and optimizing performance. The performance and reliability improvements achievable from this SBIR project are essential for widespread acceptance of electronically tinted windows. The improved transmission properties and more neutral coloration obtainable with nanostructured materials are highly desired commercial features. A successful project will lead to widespread adoption of EC windows and enable annual energy savings of up to 0.7 quad to occur sooner. This corresponds to a reduction in carbon emissions of ~10.5 million metric tons per year. In addition to architectural windows, deposition technologies for nanostructured films can improve the performance of transportation windows, flat panel displays, and alternative gate oxides for advanced CMOS technology