Phase I of this program focused on identifying and solving producibility issues with the Edge Defined Film Fed Growth (EFG) technique for producing large diameter single crystal sapphire. Phase I identified, experimentally, solutions to the problem of the occurrence of catastrophic defects in large diameter (150 and 200mm) sapphire substrates for Silicon-on-Sapphire. This resulted in either reducing or eliminating these defects all together. The remaining work to be accomplished in Phase II is to implement these solutions into full scale production of 150 and, especially, the 200 mm sapphire substrates. Phase II will also include the development of fabrication and polishing means for up to 200mm sapphire wafers. Furthermore, Phase II will establish the production techniques and capabilities for producing very thin film silicon-on-sapphire (TFSOS). The requirement is for 300 to 1000 +-2.5% silicon films, which will require very uniform CVD deposition of thicker, 2700 films of very uniform thickness (+-< 15A).