SBIR-STTR Award

X-ray optical components are required to perform a new level of material characterization at the nanometer scale and are critically needed for the advancement of emerging nanotechnology and other cutting-edge applications. Development of reflective and transmissive X-ray optics, able to reduce the spot size down to a diameter of few nm, is a significant achievement that may spur new frontiers in nanotechnology, metamaterials, biology and medical science and keep the US position of a global leader in cutting edge scientific research and development. However, the manufacturing of multilayer Laue components for X-ray optics by physical vapor deposition (PVD) requires unprecedented precision and accuracy and presents a significant process control challenge. Atomic Absorption Spectroscopy (AAS) is a promising method for accurately determining the deposition rate and composition of the deposited materials. Currently no AAS system provides the accuracy, portability and ease-of-use for adoption in the manufacturing of X-ray optics. Multiple other new-generation thin film technologies require an urgent solution to the same process control challenge. In this SBIR Phase I project AccuStrata will create a novel AAS prototype, installable on a broad variety of PVD systems for manufacturing of X-ray optics, to provide accurate and reliable deposition rate and film composition measurements for dynamic feedback control. The AAS prototype system comprises two major parts a reconfigurable hardware module located outside the PVD chamber with hallow cathode excitation sources, and a portable fiber-optic-based distributed monitoring frame installed in the area surrounding the deposited substrate inside the deposition chamber. The deposition area is monitored by several beams simultaneously to derive information about the atomic distribution over the entire substrate area for precise deposition rate monitoring. The prefabricated and optically aligned frame structure, installed inside the deposition chamber, eliminates errors associated with window deposition, changes in chamber pressure, and other process factors. The unique shielding design will minimize contamination of the optics resulting in very low long-term drift. During Phase I the prototype system will measure the atomic flux density in a configuration of 3 optical beams near the substrate and provide real-time information about the deposition rate and its fluctuation. The unique fiber optic design provides for superior protection from undesired deposition on the system components and allows easy configurability, facilitating subsequent commercialization in other fields where PVD processes are involved (optics, semiconductor, aerospace, medical, automotive, etc.). Based on its existing software platform, AccuStrata will develop user-friendly software for real-time process analysis, which will further be developed during subsequent Phase II, to create a close-loop in-situ AAS process control system. The system can be easily expanded to more complex beam configurations, such as of 3x3 mesh. It will have the capability to monitor two material concentrations simultaneously and deploy multiple fiber-coupled hollow-cathode light sources as needed for various materials required for manufacturing of X-ray optics.

Keywords:
Atomic Absorption Spectroscopy, Physical Vapor Deposition, Control Systems, Fiber Optics Summary for Members of Congress: New generation process control is needed for better high-tech manufacturing and faster adoption of cutting edge technologies in our daily life. AccuStrata will develop a novel process control system based on real-time atomic absorption spectroscopy, needed for control of thin film manufacturing processes used in today's most technologically advanced products.

Development of low-cost optical components for X-Ray microscopy and extreme ultraviolet lithography will facilitate the reduction of semiconductor chip features to a few nanometers and spur new frontiers in nanotechnology, microelectronics, neuroscience and cell biology and maintain the US position as a global leader in technology. The manufacturing of the required optical components by vacuum thin film deposition requires unprecedented precision and accuracy and presents a significant process control challenge. Currently no process control system provides the accuracy, portability and ease-of-use for adoption in the X-ray and EUVL optics. Multiple other new-generation thin film technologies require a solution to the same process control challenge in order to foster new frontiers in technology. The development of new superalloys and high entropy alloys, especially needed for the manufacturing of new generation jet turbines for commercial and military applications is another application that urgently needs a solution. During the SBIR Phase II project it was demonstrated that the Atomic absorption spectroscopy is a promising process control method, capable of accurately measuring deposition rate and composition of deposited thin films and overcoming many limitations of current methods. This SBIR Phase IIB project continues the effort to finalize the development of a novel process control system, installable on a variety of vacuum deposition systems for the manufacturing of high-precision thin films. The system provides accurate and reliable deposition rate, film composition and film uniformity measurements for dynamic feedback process control. The system comprises two major components – a hardware module located outside the deposition chamber with element specific light sources and a portable fiber-optic-based monitoring frame installed inside the deposition chamber in the area surrounding the substrate. The prefabricated and optically aligned frame, installed inside the deposition chamber, eliminates costly equipment refurbishing and allows flexibility and customization. The unique system design allows accurate measurement of the element concentration on the vicinity of the substrate. During this Phase IIB project a commercial in situ atomic spectroscopy system for thin film process control will be finalized. The system will be validated for multiple chemical elements, needed for the new generation semiconductor lithography, compound semiconductors and aerospace applications. These are all new generation applications where no commercial metrology solution is available today. Next, the system will be installed and integrated into mainstream manufacturing equipment for semiconductor and aerospace application. Validating the system for operation on equipment, widely used by real manufacturer will prepare the system for faster acceptance by the major manufacturers and will speed time to market.