The performance and productivity of DOE synchrotron systems is hindered due to focusing limitations from imperfections in the mirror surfaces. The ability to manufacture higher quality mirrors is directly limited by the accuracy and efficiency of the systems used to measure them. Currently available measurement methods do not provide the manufacturing feedback or quality control to allow efficient fabrication of the mirrors needed for DOE synchrotrons to achieve their potential. The combined Phase I/Phase II will achieve the object of improving the measurement technique and providing a complete system that can be used for production of x-ray mirrors. In Phase I we will demonstrate the capability of this measurement technique in a controlled environment for a limited range of mirrors. In Phase II, we will take a systematic approach to understand sensitivities and improve the source, alignment, and imaging systems for phase measuring deflectometry. We combine this understanding with a systems engineering approach to create a robust system that can measure a wide range of x-ray mirrors to the highest possible accuracy. Commercial Applications and Other
Benefits: The immediate benefit will come from the application of this measurement system to assess the quality of current mirrors.
