SBIR-STTR Award

Next-Generation Detector and Imager Development
Award last edited on: 12/16/2013

Sponsored Program
SBIR
Awarding Agency
DOE
Total Award Amount
$1,099,925
Award Phase
2
Solicitation Topic Code
-----

Principal Investigator
Richard Hayhurst

Company Information

American Semiconductor Inc

6987 West Targee Street
Boise, ID 83709
   (208) 336-2773
   sales@americansemi.com
   www.americansemi.com
Location: Single
Congr. District: 01
County: Ada

Phase I

Contract Number: ----------
Start Date: ----    Completed: ----
Phase I year
2010
Phase I Amount
$99,971
This proposal will utilize the demonstrated detector diodes along with conversion of the readout design to MIGFET transistors and build the MAMBO in Flexfet SOI-CMOS to eliminate the threshold shift plaguing current SOI based sensors. This project’s success will result in the demonstration of an advanced X-ray Imager that has detector diodes formed in the handle silicon and a 12-bit counter array for high dynamic range X-ray or electron microscope imaging in the SOI layer with immunity to application of large backside biases. Improvements in silicon-on-insulator (SOI) technology have resulted in development of monolithic chip designs for radiation image sensors and particle detectors by facilitating the use of the handle silicon layer for the detectors and the SOI layer for the readout circuits. Unfortunately, even the most advanced SOI-based imagers are still limited in effectiveness due to threshold (Vt) shifts when bias voltages are applied to fully deplete the handle silicon for detector performance. The required bias voltage range causes severe shifts in the Vt of the CMOS transistors of the readout circuitry.

Phase II

Contract Number: ----------
Start Date: ----    Completed: ----
Phase II year
2011
Phase II Amount
$999,954
Existing silicon on insulator (SOI) pixel detectors which integrate single gate transistors with substrate diodes are limited by two key problems. First, the SOI transistor performance is degraded by the large potentials that must be applied to the substrate to fully deplete the diodes. Secondly, the performance of these SOI pixel detectors degrades with exposure to radiation due to charge trapping in the buried oxide. However, SOI pixel detectors offer the best resolution at high speed while using less power at lower cost than competing technologies like monolithic active pixel detectors or 3-D chip stacking. American Semiconductors next generation FlexPix SOI pixel detector technology provides all of the benefits of existing SOI pixel detectors, but eliminates the two key problems that limit performance. FlexPix combines multi-independent gate Flexfet transistors with diode detectors integrated in the substrate. Flexfets unique multi-gate architecture effectively shields the transistor channel and eliminates the performance degradation due to both substrate bias and radiation charge trapping. Feasibility of the next generation x-ray imager has been established by successful completion of the design, layout, simulation, and analysis using the FlexPix SOI pixel detector technology. All Phase I technical objectives were met or exceeded through the collaborative research effort between American Semiconductor and the Fermilab Particle Physics Division. American Semiconductor exceeded the program objections by also completing the design, layout and simulation of two FlexPix advanced characterization test chips that in Phase II will provide key detector data to facilitate future designs by other government and commercial groups and spur business growth in Phase III and beyond. Successful manufacture of the substrate diodes in the FlexPix technology was demonstrated in an earlier Phase I program. Fabrication and testing of two FlexPix wafer lots will enable iterative design and process optimization to meet the requirements of the MAMBO x-ray imaging application and provide detailed process information for future business development. The first manufacturing run will employ the multi-chip configuration completed in Phase I containing both the basic x-ray imager design and the two pixel characterization test chips. The second manufacturing run will allow for design and process optimization based upon testing from the first wafer lot. For the second wafer lot, the team will create a full-scale MAMBO FlexPix x-ray imager prototype that will provide a key demonstration of the technology to spur additional business development in Phase III. Commercial Applications and Other

Benefits:
The FlexPix technology will lead to improvements in pixel detectors used in medical, military, government and related commercial imaging applications. Specific applications include high dynamic range biomedical x-ray, nondestructive and non-invasive testing, health physics, and environmental studies.