The Phase ll program will continue to explore the feasibility and scale-up of the horizontal growth of silicon sheet crystals using the edge-supported pulling (ESP) process frorr. silicon melts contained in an RF-coupled cold crucible. Theoretical evaluation of the basic Horizontal Ribbon Growth (HRG) process has shown conclusively the enormous potential of this crystal growth method; i.e., it would be possible to produce large, flat sheet crystals of silicon at extremely high growth rates. To date, however, the potential of the HRG process has not been demonstrated fully in a practical sense. Problems involving control of meltaheet temperature and melt level have not beer, resolved, and the overrriding difficulty (i.e., the crucible wall) remains a seemingly impenetrable barrier to horizontal crystal growth. Our research has shown that it is possible to confine large, high-purity silicon melts in a cold crucible while maintaining the liquid surface well over I cm above the rim of the container with a high degree of stability. Moreover, since the solid feed material is introduced continuously in the bottom of the cold crucible, precise control of the melt level can be maintained during crystal growth. The vertical edge-supported pulling process provides exceptionally stable sheet growth conditions. However, the sheet growth rates achieved to date are severely restricted by the rate of heat dissipation from the narrow sheet/melt interface. Moreover, because the filaments in the ESP process must pass through holes in the bottom of the melt container, shallow melt levels must be used and melt replenishment during growth has yet to be achieved. The Phase I portion of this program focused on determining the feasibility of adapting the edge-supported technique to horizontal ribbon growth utilizing the cold crucible, and the results achieved were most encouraging.Anticipated Results/Potential Commercial Applications as described by the awardee: Continuous silicon sheet/ribbon crystal production has been a long-sought goal, not only for the low-cost fabrication of photovoltaic devices, but for the manufacture of more sophisticated semiconductor devices as well. The cold crucible system combined with a horizontal edge-supported pulling process provides the first practical combination of existing technologies which has the promise of continuous, economical, high-quality silicon sheet production.