The objective of this proposal is to create a prototype imaging variable kinetic energy electron analyzer in the range 0.1 to 8 keV for use with an X-ray excitation source. The imaging analyzer is to have a target imaging spatial resolution of 100 nm. The X-ray excitation source will be a synchrotron light source. The instrument can be described as an X-ray photoelectron spectroscopy (XPS) microscope XPM. The microscope will use a magnetic immersion projection lens and an electrostatic hemispherical electron analyzer. The images the microscope will produce will be multidimensional spectrographic images. A second objective of this proposal is to further develop the new class of electron microscope invented in the Phase 1 work program. The new class of microscope can combine high spatial resolution and time resolved imaging. COMMERCIAL APPLICATIONS: XPS microanalysis could prove to be a significant analysis tool in the investigation of techniques for sub-micron semiconductor device physics, materials science, fiber science, and nanoscale devices. Current XPS imaging systems are limited in spatial resolution and the images have low informational value. The microscope proposed here could have widespread acceptance as a routine tool for microanalysis. An output of the Phase 1 work program was a new class of electron microscope that may have immediate applications such as in semiconductor device defect analysis
