SBIR-STTR Award

Improved Manufacturing Processes for Circular Array Detectors
Award last edited on: 11/12/2003

Sponsored Program
SBIR
Awarding Agency
DOC : NIST
Total Award Amount
$362,117
Award Phase
2
Solicitation Topic Code
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Principal Investigator
Jay S Ray

Company Information

Detector Technology Inc (AKA: DeTech)

Palmer Industrial Park 9 Third Street
Palmer, MA 01069
   (413) 284-9975
   dticorp@aol.com
   www.detechinc.com
Location: Single
Congr. District: 01
County: Hampden

Phase I

Contract Number: ----------
Start Date: ----    Completed: ----
Phase I year
2002
Phase I Amount
$68,664
Channel electron multipliers are used in a variety of applications including synchrotron research facilities. It is imperative that channel electron multiplier technology be improved for this type of application. Currently, the manufacturing process of channel multipliers is very inconsistent. When running an array of detectors each detector must act similarly. If the detectors are not matched then results may be skewed. During the shaping processes of the glass, contamination and surface imperfections can occur. Both causes inconsistency in the electrical characteristics of channel electron multipliers. In this project Detector Technology, Inc. will specifically concentrate on perfecting the manufacturing processes that contribute to inconsistencies. The resulting technology will provide a manufacturing process that will produce array detectors with matched electrical characteristics

Phase II

Contract Number: ----------
Start Date: ----    Completed: ----
Phase II year
2003
Phase II Amount
$293,453
The goal of phase 1 was to create a channel electron multiplier that could be used in an array for configuration in the synchrotron beam application. In order to have little variance in first strike statistics contamination needed to be eliminated from the surface. This was accomplished with phase 1 research. During Phase 2 the primary objective is to manufacture a circular array of multipliers that operate with consistent electrical characteristics from unit to unit. Three areas in the process will be focused on in order to obtain this consistency. One important process to be investigated is the hydrogen reduction process, which is needed to maximize the amount of semi-conducting lead on the glass surface. Another process that needs to be addressed is the wet chemistry performed both before and after the hydrogen reduction process so that the proper formation of silica occurs on the surface. The third process that will be examined is vacuum bake, which is important in removing loosely bonded gases on the surface. Finally, 32 multipliers will be mounted on a flange suitable for the NIST synchrotron beam application. This flange will be delivered to NIST along with appropriate power supplies and 32 individual preamps. COMMERCIAL APPLICATIONS: Time of flight; Hemispherical analyzers; Magnetic sectors; Mass spectrometers; and Residual gas analyzers