SBIR-STTR Award

Implementation of new gallium arsenide growth technique (vertical float zone) developed at Naval Research Lab
Award last edited on: 3/22/02

Sponsored Program
SBIR
Awarding Agency
DOD : DARPA
Total Award Amount
$424,767
Award Phase
2
Solicitation Topic Code
SB901-038
Principal Investigator
Robert H Mellen Sr

Company Information

Mellen Company Inc

40 Chenell Drive
Concord, NH 03301
   (603) 228-2929
   info@mellencompany.com
   www.mellencompany.com
Location: Single
Congr. District: 02
County: Merrimack

Phase I

Contract Number: DAAH0190C0638
Start Date: 00/00/00    Completed: 00/00/00
Phase I year
1990
Phase I Amount
$48,731
The naval research laboratory currently produces high purity, low defect, one inch diameter monocrystal GaAs by the liquid encapsulated Vertical Zone Melting technique (VZM) in a specially designed quadrant controlled Q-EDG furnace developed by the Mellen Company, Inc. The unique feature of their present Mellen furnace is its ability to precisely control the local heat flow characteristics within the molten zone in the axial, azimuthal, and radial directions (3d). Their present Q-EDG VZM furnace is an offshoot of patented pre-existing mellen Q-EDG technology used routinely for bulk growth of GaAs. It was developed by Mellen specifically for VZM and later modified by us based on operating results during development of the VZM technique. Defense system designers require production of 3" diameter, high quality, single crystal gallium arsenide wafer substrates suitable for critical applications. The utilization of Mellen "3d" Q-EDG furnace technology, M/A Com's GaAs production experience, Ed Siwggard's electronic materials research experience (the developer of VZM), along with the application of the conclusions from our recent research paper "anatomy of a temperature profile," should bring together the proper tools to "make it so. " anticipated benefits/potential commercial applications - the LEVZM growth technique used in conjunction with a modified quadrant controlled edg furnace system will be able to consistently produce 3" to 4" diameter single crystal boules of GaAs. The process developed may be applied toward growing other III-V and IL-VI semiconductor single crystal materials.Key words: gallium arsenide, MMIC, LEVZM.

Phase II

Contract Number: DAAH01-92-C-R206
Start Date: 3/10/92    Completed: 3/10/93
Phase II year
1992
Phase II Amount
$376,036
The Naval Research Laboratory currently produces high purity, low defect, one inch diameter monocrystal GaAs by the liquid encapsulated vertical zone melting technique (LEVZM) in a specially designed quadrant controlled Q-EDG furnace developed by the Mellen Company, Inc. The unique feature of their present Mellen furnace is its ability to precisely control the local heat flow characteristics within the molten zone in the axial, azimuthal, and radial directions (3d). In Phase I, Mellen used a larger, 5" diameter Q-EDG furnace, modified to include a "stealth" heater, to mechanically and thermally test the feasibility of 3-4 inch diameter growth. Tests indicate that success is within our grasp. General design and testing of the proposed new furnace for use in a manufacturing environment to produce 4" dia. high purity, single crystal GaAs as bulk material have been completed in Phase I. Phase II of this work, proposed herein, discusses the thermal and mechanical considerations cited in the Phase I final report along with a work plan to build the furnace and then test these new concepts under Phase III. A combination of proprietary existing EDG technology and proprietary new technology is utilized in this proposal to overcome the thermaland mechanical requirements of this LEVZM process. Anticipated benefits/

Potential Commercial Applications:
The LEVZM growth technique used in conjunction with a modified quadrant controlled EDG furnace system will be able to consistently produce 3" to 4" diameter single crystal boules of GaAs. The process developed may be applied toward growing other III-V and II-VI semiconductor single crystal materials.