SBIR-STTR Award

Inkjet-Printed GRIN Microlenses on CMOS Imager Wafers for Synthetic Apertures
Award last edited on: 8/15/2021

Sponsored Program
SBIR
Awarding Agency
DOD : Army
Total Award Amount
$111,500
Award Phase
1
Solicitation Topic Code
A19-115
Principal Investigator
Charles G Dupuy

Company Information

Voxtel Inc

15985 NW Schendel Avenue Suite 200
Beaverton, OR 97006
   (971) 223-5646
   info@voxtel-inc.com
   www.voxtel-inc.com
Location: Single
Congr. District: 01
County: Washington

Phase I

Contract Number: W15QKN-20-P-0029
Start Date: 10/25/2019    Completed: 12/1/2020
Phase I year
2020
Phase I Amount
$111,500
After defining the application requirements, light-field modeling and simulation tools will be used to develop candidate compact synthetic apertures sensor designs, enabled by CMOS imagers with integrated microlenses. Additive manufacturing will be used to fabricate a series of microlens arrays, that vary in shape (e.g., round, square, hexagonal), pitch (e.g., 0.25-mm, 0.5-mm, 1-mm, etc.) and format (2x2, 4x4, 10x10, 40x40, 240x240, etc.) on glass and silicon substrates. Uniform, anamorphic, and chirped microlens arrays will be fabricated and characterized. Two types of microlenses will be additive-manufactured: 1) homogeneous-composition spherical microlenses; and 2) freeform gradient-index microlenses. The ability to planarize CMOS image sensor wafers and to fabricate highly planar tuned-index spacer layers will also be demonstrated. A working functional imager will be demonstrated that integrates the custom lenslet arrays. In Phase II, the process will be optimized and printed sub-aperture image sensors will be designed that are optimized for configuration in a compact synthetic aperture array. A prototype synthetic aperture imaging system will be fabricated and demonstrated using commercial software

Phase II

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Start Date: 00/00/00    Completed: 00/00/00
Phase II year
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Phase II Amount
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