SBIR-STTR Award

Development of On-Demand Non-Polar and Semi-Polar Bulk Gallium Nitride Materials for Next Generation Electronic and Optoelectronic Devices
Award last edited on: 3/25/2009

Sponsored Program
STTR
Awarding Agency
DOD : Army
Total Award Amount
$850,000
Award Phase
2
Solicitation Topic Code
A06-T019
Principal Investigator
Paul T Fini

Company Information

Inlustra Technologies LLC

5385 Hollister Avenue Suuite 113
Santa Barbara, CA 93111
   (805) 451-3556
   fini@inlustra.com
   www.inlustra.com

Research Institution

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Phase I

Contract Number: ----------
Start Date: ----    Completed: ----
Phase I year
2006
Phase I Amount
$100,000
Inlustra Technologies and the University of California, Santa Barbara propose to grow and characterize thick non-polar and semi-polar gallium nitride (GaN) wafers that will act as seeds for subsequent GaN boule growth. In this Phase I STTR effort, Inlustra will first develop non-polar and semi-polar GaN films with smooth surfaces and minimal wafer bowing and cracking. The growth conditions for each type of crystallographic plane will be primarily optimized with respect to surface morphology. Defect reduction methods will then be applied to achieve uniformly low extended defect density across the wafer. UCSB researchers will conduct extensive microstructural, optical, and electrical characterization on these non-polar and semi-polar thick films to evaluate their utility as seeds for equiaxed GaN boule growth.

Keywords:
GALLIUM NITRIDE, GAN, BOULE, NON-POLAR, SEMI-POLAR

Phase II

Contract Number: ----------
Start Date: ----    Completed: ----
Phase II year
2008
Phase II Amount
$750,000
Inlustra Technologies and the University of California, Santa Barbara propose a Phase II STTR project to grow and characterize single-crystal boules of gallium nitride (GaN) along non-polar directions. These boules will have sufficient size to yield multiple two-inch (50.8 mm) diameter non-polar GaN substrates with n-type conductivity. During Phase II, GaN boules will be grown from high-quality non-polar GaN seed wafers initially developed during and subsequent to the Phase I effort. These 50.8 mm seed wafers will have smooth surfaces, low average microscopic defect density, and low residual strain – factors critical to successful GaN boule growth. Inlustra personnel will initially focus on seed wafer refinement, and then transition into development of optimal bulk GaN growth conditions for each non-polar seed wafer orientation. By the end of the program, boules of 50.8 mm diameter and at least 15 mm thickness will be sliced into free-standing, n-type conductive non-polar GaN substrates. UCSB personnel will conduct extensive micro¬structural, optical, and electrical characterization on seed wafers, boules, and the non-polar GaN substrates derived from them. Regular feedback on crystal surface and microstructural quality in particular will provide Inlustra with the means of improving key GaN crystal growth parameters.

Keywords:
Gallium Nitride, Gan, Single Crystal, Growth, Boule, Non-Polar