SBIR-STTR Award

A new deep-ultraviolet light source has been developed which employs a microhollow cathode discharge formed in cathode cavities with dimension on the order of 100ƒnƒ?m. The hollow-cathode lamp has numerous advantages over other light sources, including operation at relatively low voltages in a quiescent DC or repetitively pulsed mode, linear control of the intensity by controlling the current, scalability to large areas in a planar geometry, and a radiant emittance exceeding that of commercially available excimer lamps by more than an order of magnitude. This proposal describes a program to address and resolve key issues for converting this developmental ultraviolet source into a practical, manufacturable light system for use in a number of applications. This program will lead to the production of a low cost, high radiant emittance, long lifetime, large area excimer lamp which can cover a wavelength range from 76 nm to 308 nm. Applications of these novel excimer lamps are in UV polymerization and surface photo-chemistry, photolithography, bacterial decontamination, pollution control and pollutant decomposition, and lighting

Benefits:
This work will lead to a low cost, high efficincy light source which can provide cost/performance benefits over existing light sources in the areas of UV curing, photolithography (including semiconductor), bacterial decontamination of surfaces, pollution control and lighting applications. Abstract: UV radiation, gas discharge, plasma, cathodes, curing, decontamination, microdischarge, ultraviolet

A new deep-ultraviolet light source has been developed which employs a micro-hollow cathode discharge formed in cathode cavities with dimension on the order of 100 um. The hollow-cathode lamp has numerous advantages over other light sources, including operation at relatively low voltages in a quiescent DC or repetitively pulsed mode, linear control of the intensity by controlling the current, scalability to large areas, and a radiant emittance exceeding that of commercially available excimer lamps by more than an order of magnitude. This proposal describes a program to address and resolve key issues for converting this developmental ultraviolet source into a manufacturable, low cost, high radiant emittance, long lifetime, large area excimer lamp which can cover a wavelength range from 76 nm to 308 nm. The work will include incorporating these lamps into a practical system which uses these lamps to deliver ultraviolet light for a number of applications. Applications of these novel excimer lamps include UV polymerization and surface photo-chemistry, photolithography, bacterial decontamination, pollution control, chemical decomposition, generation of radicals, and general lighting.

Benefits:
Ultraviolet light is used in a variety of industrial applications, as described in the abstratct. These include UV polymerization and surface photo-chemistry, photolithography, bacterial decontamination, pollution control, chemical decomposition, generation of radicals, and general lighting. The novel excimer lamps which are the subject of this program have the potential to provide much better cost/performance characteristics than existing lamps. This will benefit commercial companies already using ultraviolet light processing by providing a better light source. It will benefit the Air Force by, for one example, creating opportunities for new material processing techniques using UV-generated radicals and direct UV illumination not possible before this lamp becomes available. Abstract: ultraviolet, microdischarge, decontamination, curing, cathode, plasma, gas discharge