This SBIR Phase I project builds upon Digital Optics Corporation's experience in the design, fabrication, and integration of micro-optics and its partners' expertise with semi-conductor plasma etching to provide an innovative approach to the manufacture of anti-reflective surface structures in infrared optical materials. Under this project, DOC and the Rockwell Science Center will develop design and fabrication technology to effectively manufacture dual band infrared AR structures in semiconductor compounds such as Cadmium Telluride and Mercury Cadmium Telluride. The proposed approach offers potential performance, cost, and manufacturability benefits over traditional AR coating methods. Both analytical and experimental work will be performed to verify the objectives of the proposed project
