SBIR-STTR Award

Complentary 2-D MESFET for Low Power Electronics
Award last edited on: 4/30/2002

Sponsored Program
SBIR
Awarding Agency
DOD : AF
Total Award Amount
$79,268
Award Phase
1
Solicitation Topic Code
AF95-138
Principal Investigator
William C B Peatman

Company Information

Advanced Device Technologies Inc

2015 Ivy Road Suite 308
Charlottesville, VA 22903
   (804) 979-4103
   N/A
   N/A
Location: Single
Congr. District: 05
County: Charlottesville city

Phase I

Contract Number: ----------
Start Date: ----    Completed: ----
Phase I year
1995
Phase I Amount
$79,268
The primary objectives of this Phase I effort are to assess the feasibility of developing a p-channel 2-D MESFET and to determine the extent of the significant reduction in power consumption of integrated circuits which may be achieved by utilizing a complementary 2-D MESFET technology. The new FET technology promises to eliminate the Narrow Channel Effect (NCE) which is one of the primary factors limiting the minimum power consumption of VLSI circuits. By eliminating the NCE, we may scale the device size dramatically and reduce the power consumption by an order of magnitude. Specifically, this project will assess the feasibility to fabricate p-channel 2-D MESFET devices, develop p-channel device models and incorporate these models into an advanced SPICE package (AIM-SPICE), simulate complementary 2-D MESFET circuits, and compare the predicted performance with the existing complementary FET technologies. We will also analyze the primary factors limiting the noise margins at low power supplies, establish the minimum required bias voltage for reliable operation, and analyze the factors determining the threshold voltage changes from device to device as well as other factors which may limit the yield and integration scale.

Keywords:
Low Power Low Power High Speed High Speed Vlsi Vlsi Complementary Complementary Manufacturing

Phase II

Contract Number: ----------
Start Date: ----    Completed: ----
Phase II year
----
Phase II Amount
----