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Lithography Cost Reduction for Rad Hard Integrated Circuits

 Project Summary
Program: SBIR Agency: DTRA
Phase I Year: 2016 Phase II Year: 2017
Phase I Dollars: Phase II Dollars:
Principal Investigator:

   Phase I Abstract   
LumArray proposes in Phase I to demonstrate that its direct-write maskless-photolithography system, the ZP-150, is capable of performing aligned cuts in 1D-grids suitable for the 45 nm node, in .....

   Phase II Abstract   
The DoD faces mounting costs for integrated circuits built with advanced technology. Our proposal addresses mixed-signal ASIC design costs and fabrication costs, notably photomask costs and .....

Recipient Firm

15 Ward Street
Somerville, MA 02143

(617) 253-6865
zpal@lumarray.com
www.lumarray.com

Principal point of contact
President/CEO:  N/A

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Contact information

Innovation Development Institute, LLC

   45 Beach Bluff Avenue, Suite 300
     Swampscott,  MA 01907-1542

  Tel:  (781) 595-2920

  support@inknowvation.com