Electron clouds in accelerators limit machine performance through associated dynamical instabilities and/or vacuum pressure increases. High wall resistivity can cause heating and instabilities in accelerators. Coating accelerator vacuum tubes with compacted thick crystalline copper will mitigate those problems and can enhance luminosity. Develop compact ion assisted deposition (IAD) devices by incorporating miniature ion sources into robotic cylindrical magnetron sputtering devices configured for small radial dimension tubes for in-situ coating of long, small diameter tubes with defect free thick films copper. Devise Ion assisted plasma deposition techniques for in-situ coating of long, small diameter tubes. Perform ion assisted copper deposition on stainless steel sample to assess ion assisted deposition technique viability; preliminary design of phase II full-scale devices. Commercial Applications and Other
Benefits: Coating of existing accelerator vacuum tubes with compacted thick crystalline copper is a very cost effective way to mitigate significant problems in accelerators trying to increase luminosity. IAD results in superior quality film deposition, which due to inefficiencies, is presently restricted to high value items. Advancing to industry forefront more cost effective IAD, will improve tools, ball bearings & other lower value industrial products, thus reducing waste as well as improving industrial accelerators and electron guns, impacting companies who utilize accelerators.
