Awards Registry

A High-Precision Three-Dimensional TEM Imaging System
Profile last edited on: 6/13/2022

Program
SBIR
Agency
DOC | NIST
Total Award Amount
$499,992
Award Phase
2
Principal Investigator
William A Hubbard
Activity Indicator

Company Information

Nanoelectronic Imaging Inc

1518 South Centinela Avenue
Los Angeles, CA 90025
   (617) 347-6436
   N/A
   www.nanoelectronicimaging.com
Multiple Locations:   
Congressional District:   37
County:   Los Angeles

Phase I

Phase I year
2020
Phase I Amount
$99,992
NanoElectronic Imaging, Inc. (NEI) is developing techniques for mapping signals in the transmission electron microscope (TEM) that are normally inaccessible. In this Phase I SBIR project, NEI will build on preliminary results to develop a quantitative, TEM-based topographic mapping technique with the potential for atomic resolution in all three spatial dimensions. This precision would be akin to an AFM-in-TEM. The technique is based on scanning TEM electron beam-induced current (STEM EBIC) imaging, which maps pixel-by-pixel the current generated in a TEM sample by the electron beam. This project will quantify the relationship between a new EBIC signal (previously discounted as ``noise’’) and topography. STEM EBIC has already been demonstrated at atomic resolution laterally, and preliminary results suggest that near-atomic resolution in height is possible. In this Phase I project, the new signal's signal-to-noise will be maximized, and its exact relationship to height will be quantifed by direct comparison to atomic force microscope (AFM) topographic maps. Finally, a statisticalanalysis of height precision, along with calibration procedures, will be developed. The reach goal of this project is to demonstrate topographic resolution comparable to, or even surpassing, NIST’s traceable AFM.

Phase II

Phase II year
2021 (last award dollars: 2021)
Phase II Amount
$400,000
___(NOTE: Note: no official Abstract exists of this Phase II projects. Abstract is modified by idi from relevant Phase I data. The specific Phase II work statement and objectives may differ)___ NanoElectronic Imaging, Inc. (NEI) is developing techniques for mapping signals in the transmission electron microscope (TEM) that are normally inaccessible. In this Phase I SBIR project, NEI will build on preliminary results to develop a quantitative, TEM-based topographic mapping technique with the potential for atomic resolution in all three spatial dimensions. This precision would be akin to an AFM-in-TEM. The technique is based on scanning TEM electron beam-induced current (STEM EBIC) imaging, which maps pixel-by-pixel the current generated in a TEM sample by the electron beam. This project will quantify the relationship between a new EBIC signal (previously discounted as ``noise’’) and topography. STEM EBIC has already been demonstrated at atomic resolution laterally, and preliminary results suggest that near-atomic resolution in height is possible. In this Phase I project, the new signal's signal-to-noise will be maximized, and its exact relationship to height will be quantifed by direct comparison to atomic force microscope (AFM) topographic maps. Finally, a statisticalanalysis of height precision, along with calibration procedures, will be developed. The reach goal of this project is to demonstrate topographic resolution comparable to, or even surpassing, NIST’s traceable AFM.