With facilities in PA and CA, RAPT has developed reactive Atom Plasma (RAP) processing, a new method for rapidly shaping and polishing optics and semiconductors. The RAP process was developed at Lawrence Livermore National Laboratory focused to providing a general tool capable of rapidly shaping and smoothing glass surfaces using an atmospheric pressure plasma. It was demonstrated that the plasma could create a very stable and deterministic tool footprint that could be used to shape precision aspheric optics without imparting any sub-surface damage. RAPT Industries is focused to developing and commercializing damage-free shaping technologies for the most demanding optical and semiconductor applications. In 2003 RAPT Industries won a prestigious Advanced Technology Program award from the Department of Commerce to further develop novel tools for optics and semiconductor manufacturing. In 2004 RAPT Industries opened up its optical manufacturing center in Freeport, Pennsylvania. RAPT Industries has pioneered the development and implementation of highly precise plasma-based tools for precision surface engineering. The firm's proprietary Reactive Atom Plasma (RAPâ¢) process is used for precision damage-free shaping of optical and semiconductor materials, selective material removal, and material deposition. The firm's patented technology is being used in select areas of optics and semiconductor device manufacturing, where rapid damage-free material removal or chemical modification of surfaces improves yields and performance. SRAPT Industries produces advanced silicon carbide optics for defense, aerospace and semiconductor applications. Capabilities include: * Flat optics up to 30 inches * Flatness of 1/100 wave RMS up to 6â * Flatness better than 1/10 wave PV up to 12â * Flatness better than 1/6 wave PV up to 18â Spherical and aspherical capability up to 500mm. Surface roughness of <3 angstroms achieved on most commercial CVD-coated mat
